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              產品展示
              ?JC系列磁控濺射鍍膜機
              • 用途及特點
              • 規格參數
                JC系列用途及特點
                Use and Features
                 
                ●磁控濺射鍍膜設備主要用于在基片上鍍制金屬、半導體、電介質、多元素化合物或混和物。利用濺射法可制備金屬膜、半導體膜、絕緣膜、硬質膜、耐熱膜、耐腐蝕膜、超導膜、磁性膜、光學膜等各種特殊性能的薄膜。
                ●基片尺寸適應范圍廣,可鍍制多種材料,工藝可控性好、靈活性強、重復性高、基片溫升小、膜層附著力強,計算機全自動控制,******性高。且安裝維護方便,占地位置小。
                JC系列磁控濺射鍍膜機
                Series JC Magnetron Sputtering Coater
                 
                主要機型及參數
                Main models and parameters
                型號
                Model
                應用特點
                Application field
                裝片工作臺特點
                Features of film loading bench
                基片尺寸
                Size of substrate
                產量/每小時
                1μ鋁層厚度
                Output per hour 1μm aluminum coating thickness
                厚度
                均勻性
                thickness homogeneity
                真空系統
                Vacuum system
                JC400-1/D 適合科研、生產硅片及砷化鎵片
                Scientific research,production of silicon film and gallium arsenide film
                全自動盒對盒送片,濺射源數量可按工藝調整,低塵粒
                Full automatic box-to-box film advance;quantity of sputtering source to be adiusted as per the process;low in density of dust particles
                4~6″ 40 ±5% 低溫泵加
                分子泵系統
                Cryogenic pump system added with molecular pump
                JC500-1/D 適用于圓形片狀工件
                Circular sheet work-piece
                工件可進行公轉,水平裝片
                Revolution of work-piece available;horizontal film loading
                4″ 16 ±8% 分子泵系統
                Turbomolecular pump system
                JC500-5/D 適用于矩形片狀工件
                Rectangular sheet work-piecevv
                工件可進行公轉,垂直裝片
                Revolution of work-piece available;vertical film loading
                150x150mm 10 ±8% 分子泵系統
                Turbomolecular pump system
                JC600-1/D 適用于矩形片狀工件
                Rectangular sheet work-piecevv
                工件架為十邊拄形,垂直裝片
                work-piece holder in decagonal column shape;vertical film loading
                280x100mm 20 ±8% 擴散泵系統
                Diffusion pump system
                JC600-2/D 適合科研、生產砷化鎵基片線寬亞微米級
                Scientific research,production of gallium arsenide film with line width at submicron level
                工件可進行自傳、公轉
                水平裝片
                Rotation and revolution of work-piece available;horizontal film loading
                3″ 24 ±5% 低溫泵系統
                Cryogenic pump system
                JC650-1/D 適用于矩形或圓形片狀工件
                Rectangular or circular sheet work-piece
                工件可進行公轉,水平裝片
                revolution of work-piece available;horizontal film loading
                Φ100mm 10 ±5% 分子泵系統
                Turbomolecular pump system
                 

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